Organic light-emitting display device and manufacturing method thereof

ABSTRACT

A method of manufacturing an OLED device includes: preparing a substrate on which a first conductive layer and a pixel defining film defining a plurality of pixels and exposing the first conductive layer for each of the plurality of pixels; disposing a photoresist pattern on the pixel defining film, the photoresist pattern comprising an opening exposing a first pixel of the plurality of pixels; disposing a first material layer onto an entire surface of the substrate to simultaneously dispose an organic light-emitting layer and a first deposition layer; disposing a second material layer onto the entire surface of the substrate to simultaneously dispose a second conductive layer and a second deposition layer; disposing a third material layer onto the entire surface of the substrate to simultaneously dispose a protection layer and a third deposition layer; and removing the photoresist pattern and the first, second, and third deposition layers.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a Division of U.S. patent application Ser. No.15/478,723, filed on Apr. 4, 2017, which claims priority from and thebenefit of Korean Patent Application No. 10-2016-0151626, filed on Nov.15, 2016, which is hereby incorporated by reference for all purposes asif fully set forth herein.

BACKGROUND Field

Exemplary embodiments relate to an organic light-emitting display deviceand a manufacturing method thereof.

Discussion of the Background

An organic light-emitting display device is a self-emission type ofdisplay device, and therefore does not require a backlight unit, unlikea light-receiving type display device such as a liquid crystal displaydevice. Accordingly, the organic light-emitting display device is usedfor various slim electrical/electronic products, such as smart phones,ultra-slim TVs, and the like.

Conventionally, a method of depositing an organic light-emitting elementby photo-patterning using a photo-mask is used to realize highresolution.

However, a lift-off layer used in the photo-patterning includes aspecial material that is expensive, and the process of removing thelift-off layer may damage the deposited organic layer.

The above information disclosed in this Background section is only forenhancement of understanding of the background of the inventive concept,and, therefore, it may contain information that does not form the priorart that is already known in this country to a person of ordinary skillin the art.

SUMMARY

Exemplary embodiments provide an organic light-emitting display device,which can prevent or reduce damage to an organic light-emitting layerfrom external air or physical and chemical impacts generated during aprocess, and a manufacturing method thereof.

Additional aspects will be set forth in the detailed description whichfollows, and, in part, will be apparent from the disclosure, or may belearned by practice of the inventive concept.

According to an exemplary embodiment, an organic light-emitting displaydevice may include: a substrate; a first conductive layer disposed onthe substrate; a pixel defining film disposed to define a plurality ofpixels on the substrate, the pixel defining film exposing at least apart of the first conductive layer for each of the plurality of pixels;an organic light-emitting layer disposed on the at least a part of thefirst conductive layer exposed by the pixel defining film; a secondconductive layer disposed on the organic light-emitting layer; aprotection layer disposed in each of the plurality of pixels on thesecond conductive layer and exposing at least a part of the secondconductive layer; and a sub-conductive layer disposed on the pixeldefining film between the plurality of pixels, the sub-conductive layerelectrically contacting with exposed portions of the second conductivelayer disposed in the plurality of pixels.

The protection layers may be disposed in the respective pixels are notin contact with each other.

The second conductive layers may be disposed in the respective pixelsare not in direct contact with each other.

The organic light-emitting layer may be surrounded and sealed by theprotection layer, the pixel defining film, the first conductive layer,and the sub-conductive layer.

The protection layer may include an inorganic material.

The sub-conductive layer may not be disposed on at least a part of theprotection layer.

The pixel defining film may include a first layer including an organicmaterial, and a second layer including an inorganic material andcovering the first layer.

According to an exemplary embodiment, an organic light-emitting displaydevice may include: a substrate; a first conductive layer disposed onthe substrate; a pixel defining film disposed to define at least onepixel on the substrate, the pixel defining film exposing at least a partof the first conductive layer in the at least one pixel; an organiclight-emitting layer disposed on at least a part of the first conductivelayer exposed by the pixel defining film; a second conductive layerdisposed on the organic light-emitting layer; a protection layerdisposed in each pixel of the at least one pixel on the secondconductive layer and exposing at least a part of the second conductivelayer; and a sub-conductive layer disposed outside the each pixel of theat least one pixel, the sub-conductive layer electrically contactingwith exposed portions of the second conductive layer.

At least a part of the protection layer may contact with thesub-conductive layer.

The organic light-emitting display device may further include a colorfilter disposed between the protection layer and the sub-conductivelayer.

According to an exemplary embodiment, a method of manufacturing anorganic light-emitting display device may include: preparing a substrateon which a first conductive layer and a pixel defining film defining aplurality of pixels and exposing the first conductive layer for each ofthe plurality of pixels; disposing a photoresist pattern on the pixeldefining film, the photoresist pattern including an opening exposing afirst pixel of the plurality of pixels; disposing a first material layeronto an entire surface of the substrate to simultaneously dispose; anorganic light-emitting layer on a portion of the first conductive layerexposed by the pixel defining film, and a first deposition layer on thephotoresist pattern; disposing a second material layer onto the entiresurface of the substrate to simultaneously dispose; a second conductivelayer on the organic light-emitting layer, and a second deposition layeron the first deposition layer; disposing a third material layer onto theentire surface of the substrate to simultaneously dispose; a protectionlayer on the second conductive layer, and a third deposition layer onthe second deposition layer; and removing the photoresist pattern andthe first, second, and third deposition layers.

At least a part of the protection layer may contact with the pixeldefining film.

The protection layer may completely cover the first conductive layer andthe organic light-emitting layer.

The organic light-emitting layer may be surrounded and sealed by theprotection layer, the pixel defining film, and the first conductivelayer.

The photoresist pattern may have an inverted taper shape.

The photoresist pattern may be formed by patterning a negativephotoresist composition.

The photoresist pattern may be removed by a lift-off process using astripper.

The method of manufacturing an organic light-emitting display device mayfurther include, after removing the photoresist pattern: disposing anorganic light-emitting layer, a second conductive layer and a protectionlayer in a second pixel of the plurality of pixels; etching a part ofthe protection layers in the first pixel and the second pixel of theplurality of pixels to expose a part of the second conductive layers inthe first pixel and the second pixel of the plurality of pixels; andforming a sub-conductive layer to electrically connect the exposedportions of the second conductive layers in the first pixel and thesecond pixel of the plurality of pixels.

The foregoing general description and the following detailed descriptionare exemplary and explanatory and are intended to provide furtherexplanation of the claimed subject matter.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are included to provide a furtherunderstanding of the inventive concept, and are incorporated in andconstitute a part of this specification, illustrate exemplaryembodiments of the inventive concept, and, together with thedescription, serve to explain principles of the inventive concept.

FIG. 1 is a schematic plan view of an organic light emitting displaydevice according to an exemplary embodiment.

FIG. 2 is cross-sectional view of the organic light emitting displaydevice taken along a sectional line II-II′ of FIG. 1.

FIGS. 3, 4, and 5 are cross-sectional views of organic light-emittingdisplay devices according to exemplary embodiments.

FIGS. 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, and 21 arecross-sectional views illustrating methods of manufacturing the organiclight-emitting display devices of FIGS. 2 and 3, according to anexemplary embodiment.

FIGS. 22, 23, and 24 are cross-sectional views illustrating methods ofmanufacturing the organic light-emitting display devices of FIGS. 4 and5, according to an exemplary embodiment.

DETAILED DESCRIPTION OF THE ILLUSTRATED EMBODIMENTS

In the following description, for the purposes of explanation, numerousspecific details are set forth in order to provide a thoroughunderstanding of various exemplary embodiments. It is apparent, however,that various exemplary embodiments may be practiced without thesespecific details or with one or more equivalent arrangements. In otherinstances, well-known structures and devices are shown in block diagramform in order to avoid unnecessarily obscuring various exemplaryembodiments.

In the accompanying figures, the size and relative sizes of layers,films, panels, regions, etc., may be exaggerated for clarity anddescriptive purposes. Also, like reference numerals denote likeelements.

When an element or layer is referred to as being “on,” “connected to,”or “coupled to” another element or layer, it may be directly on,connected to, or coupled to the other element or layer or interveningelements or layers may be present. When, however, an element or layer isreferred to as being “directly on,” “directly connected to,” or“directly coupled to” another element or layer, there are no interveningelements or layers present. For the purposes of this disclosure, “atleast one of X, Y, and Z” and “at least one selected from the groupconsisting of X, Y, and Z” may be construed as X only, Y only, Z only,or any combination of two or more of X, Y, and Z, such as, for instance,XYZ, XYY, YZ, and ZZ. Like numbers refer to like elements throughout. Asused herein, the term “and/or” includes any and all combinations of oneor more of the associated listed items.

Although the terms first, second, etc. may be used herein to describevarious elements, components, regions, layers, and/or sections, theseelements, components, regions, layers, and/or sections should not belimited by these terms. These terms are used to distinguish one element,component, region, layer, and/or section from another element,component, region, layer, and/or section. Thus, a first element,component, region, layer, and/or section discussed below could be termeda second element, component, region, layer, and/or section withoutdeparting from the teachings of the present disclosure.

Spatially relative terms, such as “beneath,” “below,” “lower,” “above,”“upper,” and the like, may be used herein for descriptive purposes, and,thereby, to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the drawings. Spatiallyrelative terms are intended to encompass different orientations of anapparatus in use, operation, and/or manufacture in addition to theorientation depicted in the drawings. For example, if the apparatus inthe drawings is turned over, elements described as “below” or “beneath”other elements or features would then be oriented “above” the otherelements or features. Thus, the exemplary term “below” can encompassboth an orientation of above and below. Furthermore, the apparatus maybe otherwise oriented (e.g., rotated 90 degrees or at otherorientations), and, as such, the spatially relative descriptors usedherein interpreted accordingly.

The terminology used herein is for the purpose of describing particularembodiments and is not intended to be limiting. As used herein, thesingular forms, “a,” “an,” and “the” are intended to include the pluralforms as well, unless the context clearly indicates otherwise. Moreover,the terms “comprises,” “comprising,” “includes,” and/or “including,”when used in this specification, specify the presence of statedfeatures, integers, steps, operations, elements, components, and/orgroups thereof, but do not preclude the presence or addition of one ormore other features, integers, steps, operations, elements, components,and/or groups thereof.

Various exemplary embodiments are described herein with reference tosectional illustrations that are schematic illustrations of idealizedexemplary embodiments and/or intermediate structures. As such,variations from the shapes of the illustrations as a result, forexample, of manufacturing techniques and/or tolerances, are to beexpected. Thus, exemplary embodiments disclosed herein should not beconstrued as limited to the particular illustrated shapes of regions,but are to include deviations in shapes that result from, for instance,manufacturing. For example, an implanted region illustrated as arectangle will, typically, have rounded or curved features and/or agradient of implant concentration at its edges rather than a binarychange from implanted to non-implanted region. Likewise, a buried regionformed by implantation may result in some implantation in the regionbetween the buried region and the surface through which the implantationtakes place. Thus, the regions illustrated in the drawings are schematicin nature and their shapes are not intended to illustrate the actualshape of a region of a device and are not intended to be limiting.

Unless otherwise defined, all terms (including technical and scientificterms) used herein have the same meaning as commonly understood by oneof ordinary skill in the art to which this disclosure is a part. Terms,such as those defined in commonly used dictionaries, should beinterpreted as having a meaning that is consistent with their meaning inthe context of the relevant art and will not be interpreted in anidealized or overly formal sense, unless expressly so defined herein.

FIG. 1 is a schematic plan view of an organic light emitting displaydevice according to an exemplary embodiment.

Referring to FIG. 1, an organic light emitting display device mayinclude a display area DA on which in a image is displayed in a planview, and a non-display area NA on which the image is not displayed. Thenon-display area NA may be formed to surround the display area DAoutside the display area DA.

A plurality of pixels PX is arranged in a matrix shape in the displayarea DA. Each pixel PX may include a first pixel PX1 emitting a firstcolor, a second pixel PX2 emitting a second color, and a third pixel PX3emitting a third color. According to an exemplary embodiment, FIG. 1illustrates that the first color, second color, and third color are red,green, and blue, respectively.

The plurality of pixels PX may be configured such that the first pixelPX1, the second pixel PX2, and the third pixel PX3 are alternatelyarranged in a horizontal direction of the plane, and the pixels emittingthe same color are continuously arranged in a vertical direction of theplane. However, the exemplary embodiments are not limited thereto.

FIG. 2 is cross-sectional view of the organic light emitting displaydevice taken along a sectional line II-II′ of FIG. 1.

Referring to FIG. 2, the organic light-emitting display device mayinclude a base substrate 101, a buffer layer 110, an active layer 121, agate insulation layer 140, a gate electrode 151, an interlayerinsulation layer 160, a source electrode 172, a drain electrode 173, aplanarization layer 180, and an organic light-emitting element 200.

The base substrate 101 may be an insulation substrate. The basesubstrate 101 may include at least one of glass and plastic. The basesubstrate 101 may be transparent, and may include an opaque materialwhen it is applied to a front emission-type organic light-emittingdisplay device.

According to exemplary embodiments, in order for the organiclight-emitting display device to be flexible, the base substrate 101 maybe made of a flexible material such as polyimide.

The buffer layer 110 may be disposed on the base substrate 101. Thebuffer layer 110 may contain at least one of silicon nitride (SiN_(X)),silicon oxide (SiO_(X)), and oxynitride (SiO_(X)N_(Y)), and may be asingle layer or a multi-layer. The buffer layer 110 may prevent orreduce the penetration of impurities, moisture and/or external air whichmay cause degradation of characteristics of semiconductor and mayplanarize a surface.

The active layer 121 is disposed on the buffer layer 110. The activelayer 121 may contain semiconductor, and may be made of polysilicon.

The active layer 121 may include a channel region 123, and a sourceregion 122 and drain region 124 adjacent to both sides of the channelregion 123. The channel region 123 may include an intrinsicsemiconductor, which is polysilicon not doped with impurities, and thesource region 122 and the drain region 124 may be made of an impuritysemiconductor, which is polysilicon doped with conductive impurities.

The gate insulation layer 140 may be disposed on the active layer 121.The gate insulation layer 140 may be an insulation layer including atleast one of silicon nitride, silicon oxide, and silicon oxynitride, andmay be a single layer or a multi-layer.

The gate electrode 151 may be disposed on the gate insulation layer 140.The gate electrode 151 may be disposed to overlap the channel region 123of the active layer 121. The source region 122 and drain region 124 ofthe active layer 121 may not overlap the gate electrode 151. The gateelectrode 151 may include at least one of aluminum (Al), molybdenum(Mo), copper (Cu), and an alloy thereof, and may have a multi-layerstructure.

The interlayer insulation layer 160 may be disposed on the gateelectrode 151. The interlayer insulation layer 160 may be an insulationlayer including at least one of silicon nitride, silicon oxide, andsilicon oxynitride, and may be a single layer or a multi-layer.

The source electrode 172 and the drain electrode 173 may be disposed onthe interlayer insulation layer 160. The source electrode 172 may bedisposed to overlap the source region 122 of the active layer 121, andthe drain electrode 173 may be disposed to overlap the drain region 124of the active layer 121.

Each of the source electrode 172 and the drain electrode 173 mayincluding at least one of aluminum (Al), molybdenum (Mo), chromium (Cr),tantalum (Ta), titanium (Ti), other refractory metals, and an alloythereof, and may have a multi-layer structure.

A source contact hole 161 and a drain contact hole 162 may be formed inthe gate insulation layer 140 and the interlayer insulation layer 160 toelectrically connect the source electrode 172 and the drain electrode173 with contact with the source region 122 and the drain region 124 ofthe active layer 121, respectively.

The active layer 121, the gate electrode 151, the source electrode 172,and the drain electrode 173 may constitute a thin film transistor T. Thegate electrode 151, the source electrode 172, and the drain electrode173 of the thin film transistor T are a control terminal, an inputterminal, and an output terminal of the thin film transistor T,respectively.

Each pixel PX may include at least one or more thin film transistors T.The thin film transistor T may be electrically connected with theorganic light-emitting element 200 to control the driving of the organiclight-emitting element 200.

The planarization layer 180 may be disposed on the source electrode 172and the drain electrode 173. The planarization layer 180 may include atleast one of silicon nitride, silicon oxide, silicon oxynitride, anacrylic organic compound having a low dielectric constant,benzocyclobutane (BCB), and perfluorocyclobutane (PFCB).

The planarization layer 180 may protect the source electrode 172 and thedrain electrode 173 and planarize the upper surface thereof. A contacthole 181 is formed in the planarization layer 180 to expose the drainelectrode 173 through the planarization layer 180.

The organic light-emitting element 200 may be disposed on theplanarization layer 180, and may include a first conductive layer 210, apixel defining film 220, an organic light-emitting layer 230, a secondconductive layer 240, a capping layer 250, a protection layer 260, asub-conductive layer 270, and a sub-protection layer 280.

The first conductive layer 210 may be disposed on the planarizationlayer 180 for each pixel PX. The first conductive layer 210 may beelectrically connected with the drain electrode 173 of the thin filmtransistor T disposed for each pixel PX through the contact hole 181formed in the planarization layer 180. The first conductive layer 210may be a pixel electrode or anode electrode of the organiclight-emitting element 200.

The first conductive layer 210 may contain a conductive material havinga high work function. For example, the first conductive layer 210 mayinclude at least one of a transparent conductive material, such asIndium Tin Oxide (ITO), Transparent Conductive Oxide (TCO), Indium ZincOxide (IZO), Zinc Oxide (ZnO), and Indium(III) oxide (In₂O₃). Moreover,the first conductive layer 210 may include a laminated film of atransparent conductive layer containing the above transparent conductivematerial and a conductive material layer including at least one of areflective metal, such as lithium (Li), calcium (Ca), aluminum (Al),silver (Ag), magnesium (Mg), and gold (Au).

The pixel defining film 220 may be disposed on the planarization layer180 to cover a part of the first conductive layer 210. The pixeldefining film 220 may define each pixel PX of the organic light-emittingelement 200. The pixel defining film 220 may include a first opening H1for exposing at least a part of the first conductive layer 210 disposedin each pixel PX.

The pixel defining film 220 may be formed of a multi-layer including afirst layer 221 including at least one of an organic material, such asan acrylic compound, polyimide (PI), benzocyclobutane (BCB) andperfluorocyclobutane (PFCB), and a second layer 222 including aninorganic material disposed covering the first layer 221. The secondlayer 222 of the pixel defining film 220 may be formed to cover the sidewall of the first opening H1 as well as the upper surface of the firstlayer 221 of the pixel defining film 220.

The pixel defining film 220 including an organic material may prevent orreduce the damage to the first conductive layer 210 during the processof forming the first opening H1 by patterning and may simplify amanufacturing process. However, air and/or moisture may permeate intothe organic light-emitting layer 230 through the pixel defining film220. Therefore, the second layer 222 including an inorganic layer mayprevent or reduce air and/or moisture from permeating into the pixeldefining film 220.

The second layer 222 of the pixel defining film 220 may include at leastone of an inorganic material, such as silicon nitride (SiN_(X)), siliconoxide (SiO_(X)), and silicon oxynitride (SiO_(X)N_(Y)), and may bedisposed to completely cover the upper surface of the first layer 221 ofthe pixel defining film 220.

The organic light-emitting layer 230 may be disposed on the firstconductive layer 210 exposed through the first opening H1. The organiclight-emitting layer 230 may be formed of a multi-layer including alight-emitting layer and at least one or more of a hole injection layer,a hole transporting layer, an electron transporting layer, and anelectron injection layer.

The organic light-emitting layer 230 may be surrounded and completelysealed by the protection layer 260, the second layer 222 of the pixeldefining film 220, the first conductive layer 210 and the sub-conductivelayer 270, each of which is made of an inorganic material. Accordingly,foreign matter and/or moisture may be effectively prevented or reducedfrom permeating into the organic light-emitting layer 230.

The organic light-emitting layers 230 disposed in the first pixel PX1,the second pixel PX2, and the third pixel PX3 may emit red, green, andblue colors, respectively.

The second conductive layer 240 may be disposed on the organiclight-emitting layer 230. The second conductive layer 240 may cover apart of the upper surface of the pixel defining film 220.

The second conductive layer 240 may contain a conductive material havinga low work function. For example, the second conductive layer 240 mayinclude at least one of a metal, such as lithium (Li), calcium (Ca),LiF/Ca, LiF/Al, aluminum (Al), magnesium (Mg), silver (Ag), platinum(Pt), palladium (Pd), nickel (Ni), gold (Au), neodymium (Nd), iridium(Ir), chromium (Cr), barium fluoride (BaF), barium (Ba), Ytterbium (Yb),a compound or mixture thereof, and may also include at least one of atransparent conductive material, such as ITO, TCO, IZO, ZnO, and In₂O₃.

In an exemplary embodiment, the second conductive layer 240 may be athin metal layer including at least one of Ag and Mg, a transparentconductive film including TCO, or a multi-layer in which the thin metallayer and the transparent conductive film are laminated. Thus, the lightemitted from the organic light-emitting layer 230 disposed beneath thesecond conductive layer 240 may pass through the second conductive layer240. However, the exemplary embodiments are not limited thereto.

The second conductive layer 240 may be disposed in an island shapedisposed discontinuously in the first opening H1 of each pixel PX.Therefore, the second conductive layers 240 disposed in each pixel PXmay not be in direct contact with each other. The second conductivelayer 240 disposed in each pixel PX may be a cathode electrode of theorganic light-emitting element 200, and may be a common electrodeelectrically connected through the sub-conductive layer 270.

The capping layer 250 may be disposed on the second conductive layer240. The capping layer 250 can improve the light extraction efficiencyof the organic light-emitting layer 230, and can protect the organiclight-emitting layer 230 from plasma at the time of patterning theorganic light-emitting element 200. According to the exemplaryembodiments, the capping layer 250 may be omitted.

The protection layer 260 may be disposed on the capping layer 250. Whenthe capping layer 250 is omitted, the protection layer 260 may bedirectly disposed on the second conductive layer 240.

The protection layer 260 may be disposed to encapsulate the underlyingelements including the organic light-emitting layer 230, and can preventor reduce damage to the organic light-emitting layer 230 from removing aphotoresist formed during process of patterning the organiclight-emitting element 200. Therefore, by disposing the protection layer260, an expensive lift-off layer may be omitted. Further, the protectionlayer 260 may protect the formed organic light-emitting layer 230 fromexternal shock, an etching material and/or external air when forming onekind of the organic light-emitting layer 230 in any one of pixel PX thenforming another kind of the organic light-emitting layer 230 in anotherpixel PX.

The protection layer 260 may be disposed to cover the second conductivelayer 240 and the capping layer 250 and expose a part of the secondconductive layer 240. Specifically, a part of the outer portion of thesecond conductive layer 240 may be exposed and not be covered by theprotection layer 260, and the second conductive layer 240 may beelectrically connected with the sub-conductive layer 270 through theexposed portion.

The protection layer 260 may be disposed in each pixel PX. Thus, theprotection layers 260 disposed in the respective pixels PX may bedisposed not to be in contact with each other.

The protection layer 260 may include at least one of an inorganicmaterial, such as silicon nitride (SiN_(X)), silicon oxide (SiO_(X)),and silicon oxynitride (SiO_(X)N_(Y)).

The sub-conductive layer 270 may be disposed on the pixel defining film220 between the respective pixels PX. Thus, the sub-conductive layer 270may be disposed outside any one pixel PX. The sub-conductive layer 270is in contact with the exposed portion of the second conductive layer240 of the adjacent pixel PX, thereby electrically connecting the secondconductive layers 240 disposed in the different pixels PX with eachother.

In an exemplary embodiment, the sub-conductive layer 270 may be disposedto fill a space or boundary between the plurality of pixels PX dividedin a lattice shape in plan view, and to partially overlap the exposedportions of the second conductive layer 240 disposed in each pixel PX.The overlapped portion may be a portion where the sub-conductive layer270 and the second conductive layer 240 are in contact with each other.

The sub-conductive layer 270 may be disposed to cover the surface of thepixel defining film 220 and at least a part of lateral surfaces of thesecond conductive layer 240, capping layer 250 and protection layer 260.The sub-conductive layer 270 may not be disposed on at least a part ofthe protection layer 260. For example, the sub-conductive layer 270 maynot be disposed on the part of the protection layer 260 that overlapsthe pixel PX region. Further, the sub-conductive layer 270 may notoverlap the organic light-emitting layer 230.

The sub-conductive layer 270 may contain the material that can becontained in the second conductive layer 240, and may be made of thesame material as the second conductive layer 240. Since thesub-conductive layer 270 may not be disposed on a path through whichlight is emitted from the organic light-emitting layer 230, thesub-conductive layer 270 may be formed to be thicker than the secondconductive layer 240.

The sub-protection layer 280 may be disposed on the protection layer 260to cover the protection layer 260 and the sub-conductive layer 270. Thesub-protection layer 280 may complement the function of the protectionlayer 260, and may include the material of the protection layer 260, ormay be made of the same material as the protection layer 260. Thesub-protection layer 280 may be omitted.

Since the organic light-emitting display device according to theexemplary embodiment includes the organic light-emitting layer 230surrounded and completely sealed by the protection layer 260, the secondlayer 222 of the pixel defining film 220, the first conductive layer210, and the sub-conductive layer 270, foreign matter and/or moisturemay be effectively prevented or reduced from permeating into the organiclight-emitting layer 230.

Further, the organic light-emitting layer 230 can be packaged for eachpixel by the protection layer 260 independently disposed in each pixel,and therefore, damage or defects caused in the organic light emittinglayer 230 disposed in one pixel may not affect the organic lightemitting layer 230 disposed in other pixels.

FIG. 3 is a cross-sectional view of an organic light-emitting displaydevice according to an exemplary embodiment.

The organic light-emitting display device of FIG. 3 is substantially thesame as the organic light-emitting display device illustrated in FIG. 2,except that a sub-protection layer 281 is disposed to cover only theprotection layer 260 and not cover a sub-conductive layer 271.Hereinafter, redundant descriptions will be omitted.

Referring to FIG. 3, the sub-protection layer 281 may be disposed on theprotection layer 260 to cover the protection layer 260. Thesub-conductive layer 271 may be disposed on the pixel defining film 220to cover at least a part of lateral surfaces of the second conductivelayer 240, capping layer 250, protection layer 260, and thesub-protection layer 281.

Since the organic light-emitting display device shown in FIG. 3 includesthe organic light-emitting layer 230 is surrounded and completely sealedby the protection layer 260, the second layer 222 of the pixel definingfilm 220, the first conductive layer 210, and the sub-conductive layer270, foreign matter and/or moisture may be effectively prevented orreduced from permeating into the organic light-emitting layer 230.Further, the organic light-emitting layer 230 can be packaged for eachpixel by the protection layer 260 independently disposed in each pixel,and therefore, damage or defects caused in the organic light emittinglayer 230 disposed in one pixel may not affect the organic lightemitting layer 230 disposed in other pixels.

Further, the sub-protection layer 281 is directly disposed on theprotection layer 260, and therefore, the organic light emitting layer230 may have increased protection.

FIG. 4 is a cross-sectional view of an organic light-emitting displaydevice according to an exemplary embodiment.

The organic light-emitting display device of FIG. 4 is substantially thesame as the organic light-emitting display device illustrated in FIG. 2,except that a color filter 310, a sub-conductive layer 272, asub-protection layer 282 and a black matrix 320 are sequentiallylaminated on the protection layer 260. Hereinafter, redundantdescriptions will be omitted.

Referring to FIG. 4, the color filter 310 may be disposed on theprotection layer 260. The color filter 310 may selectively transmit thelight emitted from the organic light-emitting layer 230 disposedthereunder according to its wavelength.

The color filter 310 may be divided into a first color filter 311, asecond color filter 312, and a third color filter, respectivelycorresponding to the first color, second color, and third color, and maybe respectively disposed in the first pixel PX1, the second pixel PX2,and the third pixel PX3.

The sub-conductive layer 272 may be disposed on the color filter 310.The sub-conductive layer 272, unlike the sub-conductive layer 270 shownin FIG. 2, may be continuously disposed to cover all the exposedsurfaces of the pixel defining film 220, the second conductive layer240, the capping layer 250, the protection layer 260, and the colorfilter 310.

The sub-protection layer 282 may be disposed on the sub-conductive layer272 to cover the sub-conductive layer 272.

The black matrix 320 may be disposed on the sub-protection layer 282between the pixels PX. The black matrix 320 may guide the light emittedfrom the organic light-emitting layer 230 to be emitted to only the areaconfined to each pixel PX. Further, the black matrix 320 may alsoprevent or reduce the external light reflection by the sub-conductivelayer 272 between the pixels PX.

Since the organic light-emitting display device shown in FIG. 4 includesthe organic light-emitting layer 230 surrounded and completely sealed bythe protection layer 260, the second layer 222 of the pixel definingfilm 220, the first conductive layer 210, and the sub-conductive layer270, foreign matter and/or moisture may be effectively prevented orreduced from permeating into the organic light-emitting layer 230.Further, the organic light-emitting layer 230 can be packaged for eachpixel by the protection layer 260 independently disposed in each pixel,and therefore, damage or defects caused in the organic light emittinglayer 230 disposed in one pixel may not affect the organic lightemitting layer 230 disposed in other pixels.

FIG. 5 is a cross-sectional view of an organic light-emitting displaydevice according to an exemplary embodiment.

The organic light-emitting display device of FIG. 5 is substantially thesame as the organic light-emitting display device illustrated in FIG. 4,except that a sub-protection layer 283 is disposed on a black matrix321. Hereinafter, redundant descriptions will be omitted.

Referring to FIG. 5, the black matrix 321 may be disposed on thesub-conductive layer 272 between the pixels PX, and the sub-protectionlayer 283 may be disposed on the black matrix 321 to cover the blackmatrix 321 and the sub-conductive layer 272.

Since the organic light-emitting display device shown in FIG. 5 includesthe organic light-emitting layer 230 surrounded and completely sealed bythe protection layer 260, the second layer 222 of the pixel definingfilm 220, the first conductive layer 210, and the sub-conductive layer270 may be completely sealed, Thus, foreign matter and/or moisture maybe effectively prevented or reduced from permeating into the organiclight-emitting layer 230. Further, the organic light-emitting layer 230can be packaged for each pixel by the protection layer 260 independentlydisposed in each pixel, and therefore, damage or defects occurring inthe organic light emitting layer 230 disposed in one pixel may notaffect the organic light emitting layer 230 disposed in other pixels.

Further, since the sub-protection layer is disposed to cover the blackmatrix 321, the black matrix 321 can also be protected from thepermeation of moisture, external air, or foreign matter.

Hereinafter, exemplary methods of manufacturing the organiclight-emitting display devices will be described, according to theexemplary embodiments.

FIGS. 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, and 20 arecross-sectional views illustrating method of manufacturing the organiclight-emitting display device of FIG. 2, according to an exemplaryembodiment.

Referring to FIG. 6, a buffer layer 110, an active layer 121, a gateinsulation layer 140, a gate electrode 151, an interlayer insulationlayer 160, a source electrode 172, a drain electrode 173, aplanarization layer 180, and a first conductive layer 210 are disposedon a base substrate 101. Any conventional method may be used to disposethe elements illustrated in the FIG. 6.

Referring to FIG. 7, a pixel defining film 220 including a first openingH1 exposing the first conductive layer 210 is disposed on theplanarization layer 180. Specifically, a first layer 221 of the pixeldefining film 220 is formed by laminating organic films including atleast one of an acrylic compound, polyimide (PI), benzocyclobutane (BCB)and patterning the laminated organic films. Subsequently, a second layer222 of the pixel defining film 220 is formed on the first layer 221 ofthe pixel defining film 220 by laminating inorganic films including atleast one of an inorganic material, such as silicon nitride (SiN_(X)),silicon oxide (SiO_(X)), silicon oxynitride (SiO_(X)N_(Y)) andpatterning the laminated inorganic films.

Referring to FIG. 8, subsequently, a first photoresist pattern 510 isdisposed on the pixel defining film 220. The first photoresist pattern510 may be formed by applying a photoresist composition onto the pixeldefining film 220 to cover the pixel defining film 220 and the firstopening H1 and then patterning the photoreisist composition. Thephotoresist composition may be patterned by aligning a mask, exposingthe photoresist composition to light and then developing the exposedphotoresist composition with a developer.

The first photoresist pattern 510 may be formed to define a secondopening H2 exposing an area where a part of pixel PX is defined. Thus,the first photoresist pattern 510 may be formed to expose some pixels ofa plurality of pixels PX and cover other pixels and elements. Referringto FIG. 8 the first photoresist pattern 510 is formed to expose only thearea corresponding to the first pixel PX1 emitting the first color andcover the other area.

The first photoresist pattern 510 may be formed to have an invertedtaper shape. In an exemplary embodiment, the first photoresist pattern510 may be formed by patterning a negative photoresist composition, soas to have an inverted tape shape. However, the exemplary embodimentsare not limited thereto.

Referring to FIG. 9, subsequently, through the second opening H2, anorganic light-emitting layer 230 is formed on the first conductive layer210 exposed by the first opening H1. The organic light-emitting layer230 may be deposited by a method, such as an evaporation method using acrucible.

The organic light emitting layer 230 may be formed by depositing a firstdeposition material including an organic light-emitting material on thefirst conductive layer 210 exposed by the second opening H2 and thefirst opening H1. The deposition of the first deposition material may beperformed by a overall deposition without using a mask. Accordingly, thefirst deposition material is deposited not only onto the portion exposedthrough the second opening H2 but also on the first photoresist pattern510, so as to form a first deposition layer 610.

The organic light-emitting layer 230 may be formed into a multi-layer bydepositing a light-emitting layer and at least one of a hole injectionlayer, a hole transporting layer, an electron transporting layer, and anelectron injection layer, and several kinds of deposition materials maybe used in order to deposit the above layers. Accordingly, the firstdeposition layer 610 may also be formed into a multi-layer.

Referring to FIG. 10, subsequently, through the second opening H2, asecond conductive layer 240 is formed on the organic light-emittinglayer 230.

The second conductive layer 240 may be formed by applying a seconddeposition material including at least one of a metal, such as Ag, Mg,Al, and Yb, or a transparent conductive material, such as ITO, IZO, andTCO, onto the organic light-emitting layer 230 exposed by the secondopening H2 using various methods including a sputtering method, aphysical vapor deposition (PVD) method, a plating method, or the like.

The method of forming the second conductive layer 240 may be anisotropic method. Thus, the second conductive layer 240 may be formed tohave a larger area than the second opening H2, and may be formed tocover the upper surface of the organic light-emitting layer 230 and apart of the lateral surface and upper surface of the pixel defining film220.

The deposition of the second deposition material may also be an overalldeposition without using a separate mask. Accordingly, the seconddeposition material is deposited not only on the portion exposed throughthe second opening H2 but also on the first deposition layer 610 formedon the first photoresist pattern 510, so as to form a second depositionlayer 620.

Referring to FIG. 11, subsequently, through the second opening H2, acapping layer 251 is formed on the second conductive layer 240. Thecapping layer 251 may be formed by depositing a third depositionmaterial on the second conductive layer 240 exposed by the secondopening H2.

The formation of the capping layer 251 may be an isotropic depositionprocess. Thus, the capping layer 251 may be formed to have a larger areathan the second opening H2, and may be formed to cover the upper surfaceof the second conductive layer 240 and a part of the upper surface ofthe pixel defining film 220.

However, the exemplary embodiments are not limited thereto, and thecapping layer 251 may be formed to cover only a part of the uppersurface of the second conductive layer 240 according to processconditions.

The third deposition material is deposited not only on the portionexposed through the second opening H2 but also on the second depositionlayer 620 formed on the first photoresist pattern 510, so as to form athird deposition layer 630.

The step of forming the capping layer 251 may be omitted. Thus, aprotection layer 261 may be directly formed on the second conductivelayer 240.

Referring to FIG. 12, subsequently, through the second opening H2, theprotection layer 261 is formed on the capping layer 251. When thecapping layer 251 is omitted, the protection layer 261 may be formed onthe second conductive layer 240.

The protection layer 261 may be formed by depositing a fourth depositionmaterial including at least one of an inorganic material, such assilicon nitride (SiN_(X)), silicon oxide (SiO_(X)), or siliconoxynitride (SiO_(X)N_(Y)), onto the capping layer 251 exposed by thesecond opening H2.

The deposition of the fourth deposition material may be an isotropicprocess. Thus, the protection layer 261 may be formed to have a largerarea than the second opening H2, and may be formed to cover the uppersurfaces of the second conductive layer 240 and the capping layer 251and a part of the upper surface of the pixel defining film 220.

The fourth deposition material is deposited not only on the portionexposed through the second opening H2 but also on the third depositionlayer 630 formed on the first photoresist pattern 510, so as to form afourth deposition layer 640.

The protection layer 261 may be formed to completely cover the organiclight-emitting layer 230 and second conductive layer 240 disposedthereunder. Specifically, the outside of the protection layer 261 may beformed in contact with the pixel defining film 220 to prevent theorganic light-emitting layer 230 and second conductive layer 240disposed thereunder from being exposed.

Referring to FIG. 13, subsequently, the first photoresist pattern 510 isremoved. The first photoresist pattern 510 is removed, and thus thefirst, second, third, and fourth deposition layers 610, 620, 630, and640 formed on the first photoresist pattern 510 may also be removed.

The first photoresist pattern 510 may be removed by a lift-off processusing a stripper. When the first photoresist pattern 510 has an invertedtape shape, the lift-off process may be easily performed.

When the second conductive layer 240, the capping layer 251, and theprotection layer 261 are deposited by chemical vapor deposition (CVD),the second conductive layer 240, the capping layer 251, and theprotection layer 261 may be discontinuously formed without beingconnected with the second, third, and fourth deposition layers 620, 630,and 640 formed on the first photoresist pattern 510, and thus thelift-off process may be easily performed.

However, the exemplary embodiments are not limited thereto. Even byatomic layer deposition, the second conductive layer 240, the cappinglayer 251, and the protection layer 261 may be discontinuously formedwith the second, third, and fourth deposition layers 620, 630, and 640,and thus the lift-off process may be easily performed.

FIG. 14 is a cross-sectional view showing a method of removing the firstphotoresist pattern 510 according to an exemplary embodiment.

Referring to FIG. 14, a second photoresist pattern 520 is formed to fillthe region exposed by the second opening H2 of FIG. 12. The secondphotoresist pattern 520 may be formed higher than the first photoresistpattern 510.

The second photoresist pattern 520 may be formed by applying aphotoresist composition to cover the first photoresist pattern 510 andthe second opening H2 and then patterning the photoresist composition.

The second photoresist pattern 520 may be formed to have a taper shape.In an exemplary embodiment, the second photoresist pattern 520 may beformed by patterning a positive photoresist composition, so as to have ataper shape. However, the exemplary embodiments are not limited thereto.

The first photoresist pattern 510 in the region where the secondphotoresist pattern 520 may be first removed, and the second photoresistpattern 520 may be subsequently removed, so as to form the state shownin FIG. 13.

The first photoresist pattern 510 and the second photoresist pattern 520may include materials that can be removed by different strippers fromeach other. However, the exemplary embodiments are not limited thereto,and the first photoresist pattern 510 and the second photoresist pattern520 may include materials that can be removed by the same stripper.

In an exemplary embodiment, the second, third, and fourth depositionlayers 620, 630, and 640 made of an inorganic material and formed on thefirst photoresist pattern 510 are removed by dry etching, and then thefirst deposition layer 610 and the first and second photoresist patterns510 and 520 are removed by wet etching. However, the exemplaryembodiments are not limited thereto, and, any kind of removal methods,such as dry etching, wet etching, and ashing may be selected in anyorder appropriate.

The second photoresist pattern 520 is formed in the pixel (PX) regionexposed by the second opening H2 and then removed, thereby preventingthe elements, such as the organic light-emitting layer 230 and theprotection layer 261, disposed in the pixel (PX) region, from beingdamaged when lifting-off the first photoresist pattern 510.

FIG. 15 is a cross-sectional view showing a method of removing the firstphotoresist pattern 510 according to an exemplary embodiment.

Referring to FIG. 15, a second photoresist pattern 521 is formed in thesecond opening H2 of FIG. 12. The second photoresist pattern 521 may beformed lower than the first photoresist pattern 510.

The second photoresist pattern 521 may be formed by applying aphotoresist composition to cover the first photoresist pattern 510 andthe second opening H2 and then front-developing the photoresistcomposition. When the photoresist composition is front-developed, thephotoresist composition on the first photoresist pattern 510 is removed,and the second photoresist pattern 521 formed in the second opening H2may be formed lower than the first photoresist pattern 510.

Subsequently, the first photoresist pattern 510 and the secondphotoresist pattern 521 are removed, so as to form the state shown inFIG. 13.

In an exemplary embodiment, the first photoresist pattern 510 and thesecond photoresist pattern 521 may include materials that can be removedby the same stripper. However, the exemplary embodiments are not limitedthereto, and the first photoresist pattern 510 and the secondphotoresist pattern 521 may include materials that can be removed bydifferent strippers from each other.

In an exemplary embodiment, the first photoresist pattern 510 may beremoved by a first stripper, the second, third, and fourth depositionlayers 620, 630, and 640 may be removed by dry etching, and then thesecond photoresist patterns 521 may be removed by a second stripperdifferent from the first stripper, in the given sequence. Accordingly,it is possible to prevent or reduce generation of bulky inorganicparticles which may clog filters during the process.

Referring to FIG. 16, the organic light-emitting layer 230, the secondconductive layer 240, the capping layer 251, and the protection layer261 are formed in the remaining pixel (PX) regions in the same mannerillustrated in FIGS. 6, 7, 8, 9, 10, 11, 12, 13, 14, and 15.

It is shown in FIG. 16 that the above layers are formed in the secondpixel PX2 emitting the second color and the third pixel PX3 emitting thethird color. The organic light-emitting layers 230 in the second pixelPX2 and third pixel PX3 may emit the light having a wavelength differentfrom that of the organic light-emitting layer in the first pixel PX1.

By disposing the protection layer 261 completely covering the organiclight-emitting layer 230 and the second conductive layer 240, thepreviously disposed organic light-emitting layer 230 may be protectedfrom external air, foreign matter, physical and chemical impactsoccurring during the process, or the like during subsequent processes offorming an organic light-emitting element 200 for other pixels PX. Theorganic light-emitting layer 230 is surrounded by the first conductivelayer 210 beneath the lower side thereof, the pixel defining film 220 onthe lateral side thereof, and the protection layer 261 on the upper sidethereof, so the organic light emitting layer 230 may be completelysealed.

Referring to FIG. 17, subsequently, a third photoresist pattern 530 isformed on the protection layer 261. The third photoresist pattern 530may be formed not to cover the outer side of the protection layer 261.Thus, some of the outer sides of the protection layer 261 and the secondconductive layer 240 may not overlap the third photoresist pattern 530.

The third photoresist pattern 530 may have an inverted taper shape.Since the method of forming the third photoresist pattern 530 issubstantially the same as the method of forming the first photoresistpattern 510, a redundant description will be omitted.

Referring to FIG. 18, subsequently, the capping layer 251 and theprotection layer 261 are etched to expose at least a part of the secondconductive layer 240. Specifically, portions of the capping layer 251and the protection layer 261 that do not overlap the third photoresistpattern 530 in the outer side of the second conductive layer 240 may beetched.

Referring to FIG. 19, subsequently, a sub-conductive layer 270 isdisposed electrically connecting the exposed portions of the secondconductive layer 240.

The sub-conductive layer 270 may electrically connect the secondconductive layer 240 of one pixel PX with the second conductive layer240 of each pixel PX, so as to function as a common electrode.

The sub-conductive layer 270 may be formed by applying a fifthdeposition material including at least one of a metal, such as Ag, Mg,Al, and Yb, and a transparent conductive material, such as ITO, IZO, orTCO, onto the exposed portions of the pixel defining film 220 and thesecond conductive layer 240 by sputtering, physical vapor deposition(PVD), plating, or the like.

The sub-conductive layer 270 may be formed on the pixel defining film220 to be in contact with the exposed portions of the second conductivelayers 240 disposed in the pixels PX different from each other, and mayalso be partially in contact with the capping layer 250 and theprotection layer 260.

Since the sub-conductive layer 270 is formed in the region between thepixels PX, not in the region where the pixel PX is defined, thesub-conductive layer 270 may be formed thicker than the secondconductive layer 240.

The fifth deposition material is deposited even on the third photoresistpattern 530, so as to form a fifth deposition layer 650.

Referring to FIG. 20, subsequently, the third photoresist pattern 530 isremoved. With the removal of the third photoresist pattern 530, thefifth deposition layer 650 formed on the third photoresist pattern 530may also removed.

The third photoresist pattern 530 may be removed by a lift-off processusing a stripper. When the third photoresist pattern 530 has an invertedtape shape, the lift-off process may be easily performed. However, theexemplary embodiments are not limited thereto, and, as shown in FIG. 21,a fourth photoresist pattern 540 having a taper shape may also be used.

Subsequently, a sub-protection layer 280 is formed, so as to manufacturethe organic light-emitting display device shown in FIG. 2. Further, theorganic light emitting display device shown in FIG. 3 may also bemanufactured by reversing the formation order of the sub-conductivelayer 270 and the sub-protection layer 280.

FIGS. 22, 23, and 24 are cross-sectional views illustrating methods ofmanufacturing the organic light-emitting display devices of FIGS. 4 and5, according to an exemplary embodiment.

Referring to FIG. 22, a color filter 310 is formed on the protectionlayer 261 of FIG. 16. The color filter 310 may be formed not to coverthe outer sides of the protection layer 261 and the second conductivelayer 240. Thus, some of the outer sides of the protection layer 261 andthe second conductive layer 240 may not overlap the color filter 310.

The color filter 310 may include a first color filter 311, a secondcolor filter 312, and a third color filter 313, which filter a firstcolor, a second color, and a third color, respectively, for each of thefirst pixel PX1, the second pixel PX2, and the third pixel PX3.

Referring to FIG. 23, subsequently, the capping layer 251 and theprotection layer 261 are etched to expose at least a part of the secondconductive layer 240. Specifically, portions of the capping layer 251and the protection layer 261 that do not overlap the color filter 310 inthe outer side of the second conductive layer 240 may be etched.

Referring to FIG. 24, subsequently, a sub-conductive layer 272 forconnecting the exposed portions of the second conductive layer 240 isformed.

Since the color filter 310, unlike the third photoresist pattern 530 andthe fourth photoresist pattern 540, is not separately removed, thesub-conductive layer 272, unlike the sub-conductive layer 270 of FIG.20, may be continuously formed to cover all the exposed surfaces of thepixel defining film 220, the second conductive layer 240, the cappinglayer 250, the protection layer 260, and the color filter 310.

Subsequently, sub-protection layers 282 and 283 and black matrices 320and 321 are formed on the sub-conductive layer 272, so as to manufacturethe organic light-emitting display devices shown in FIGS. 4 and 5.

The exemplary embodiments may have following effects.

The organic light-emitting display device according to the exemplaryembodiments may include a protection layer to prevent or reduce damageto an organic light-emitting layer from physical and chemical shocksgenerated from external air or a manufacturing process.

Moreover, the organic light-emitting display device according to theexemplary embodiments may include sub-conductive layers electricallyconnecting the second conductive layers of each pixel disconnected inthe process of forming the protection layer.

Although certain exemplary embodiments and implementations have beendescribed herein, other embodiments and modifications will be apparentfrom this description. Accordingly, the inventive concepts are notlimited to such embodiments, but rather to the broader scope of thepresented claims and various obvious modifications and equivalentarrangements.

What is claimed is:
 1. A light-emitting display device, comprising: asubstrate; a first conductive layer disposed on the substrate; a firstinsulating layer disposed on the first conductive layer, the firstinsulating layer including an opening overlapping the first conductivelayer; a light-emitting layer disposed in the opening; a secondconductive layer disposed on the light-emitting layer; a secondinsulating layer disposed on the second conductive layer and exposing aportion of the second conductive layer; and a sub-conductive layerdisposed on the first insulating layer, the sub-conductive layercontacting the portion of the second conductive layer, wherein thelight-emitting layer is interposed between the second insulating layerand the first conductive layer.
 2. The light-emitting display device ofclaim 1, wherein the second insulating layer is provided in a plural andeach of a plurality of the second insulating layers are separated fromeach other.
 3. The light-emitting display device of claim 1, wherein thesecond conductive layer is provided in a plural, and each of a pluralityof the second conductive layers are separated from each other.
 4. Thelight-emitting display device of claim 1, wherein the light-emittinglayer is surrounded and sealed by the second insulating layer, the firstinsulating layer, the first conductive layer, and the sub-conductivelayer.
 5. The light-emitting display device of claim 1, wherein thesecond insulating layer comprises an inorganic material.
 6. Thelight-emitting display device of claim 1, wherein a portion of thesecond insulating layer does not overlap the sub-conductive layer. 7.The light-emitting display device of claim 1, wherein the firstinsulating layer comprises: a first layer comprising an organicmaterial; and a second layer comprising an inorganic material andcovering the first layer.
 8. A light-emitting display device,comprising: a substrate; a first conductive layer disposed on thesubstrate; a first insulating layer disposed on the first conductivelayer, the first insulating layer including an opening that exposes aportion of the first conductive layer; a light-emitting layer disposedon the portion of the first conductive layer; a second conductive layerdisposed on the light-emitting layer; a second insulating layer disposedon the second conductive layer and exposing a portion of the secondconductive layer; and a sub-conductive layer disposed on the secondinsulating layer, the sub-conductive layer directly contacting theportion of the second conductive layer wherein the light-emitting layeris interposed between the second insulating layer and the firstconductive layer.
 9. The light-emitting display device of claim 8,wherein the light-emitting layer is surrounded and sealed by the secondinsulating layer, the first insulating layer, the first conductivelayer, and the sub-conductive layer.
 10. The light-emitting displaydevice of claim 8, wherein a portion of the second insulating layer doesnot overlap the sub-conductive layer.
 11. The light-emitting displaydevice of claim 8, wherein a portion of the second insulating layerdirectly contacts the sub-conductive layer.
 12. The light-emittingdisplay device of claim 8, further comprising: a color filter disposedbetween the second insulating layer and the sub-conductive layer.
 13. Amethod of manufacturing an organic light-emitting display device,comprising: preparing a substrate on which a first conductive layer anda pixel defining film defining a plurality of pixels and exposing thefirst conductive layer for each of the plurality of pixels; disposing aphotoresist pattern on the pixel defining film, the photoresist patterncomprising an opening exposing a first pixel of the plurality of pixels;disposing a first material layer onto an entire surface of the substrateto simultaneously dispose an organic light-emitting layer on a portionof the first conductive layer exposed by the pixel defining film, and afirst deposition layer on the photoresist pattern; disposing a secondmaterial layer onto the entire surface of the substrate tosimultaneously dispose a second conductive layer on the organiclight-emitting layer, and a second deposition layer on the firstdeposition layer; disposing a third material layer onto the entiresurface of the substrate to simultaneously dispose a protection layer onthe second conductive layer, and a third deposition layer on the seconddeposition layer; and removing the photoresist pattern and the first,second, and third deposition layers.
 14. The method of claim 13, whereinat least a part of the protection layer contacts with the pixel definingfilm.
 15. The method of claim 13, wherein the protection layercompletely covers the first conductive layer and the organiclight-emitting layer.
 16. The method of claim 13, wherein the organiclight-emitting layer is surrounded and sealed by the protection layer,the pixel defining film, and the first conductive layer.
 17. The methodof claim 13, herein the photoresist pattern has an inverted taper shape.18. The method of claim 17, wherein the photoresist pattern is formed bypatterning a negative photoresist composition.
 19. The method of claim13, wherein the photoresist pattern is removed by a lift-off processusing a stripper.
 20. The method of claim 13, further comprising, afterremoving the photoresist pattern: disposing an organic light-emittinglayer, a second conductive layer and a protection layer in a secondpixel of the plurality of pixels; etching a part of the protectionlayers in the first pixel and the second pixel of the plurality ofpixels to expose a part of the second conductive layers in the firstpixel and the second pixel of the plurality of pixels; and forming asub-conductive layer to electrically connect the exposed portions of thesecond conductive layers in the first pixel and the second pixel of theplurality of pixels.
 21. The light-emitting display device of claim 1,further comprising a sub-protection layer covering the second insulatinglayer and the sub-conductive layer, wherein the sub-protection layerdirectly contacts the sub-conductive layer.